CARBON TETRALUORIDE (CF4)
Application:
- Carbon Tetrafluoride (CF4) is a gas used in plasma engraving, widely used in the microelectronics industry today. It is used for etching Silicon Dioxite, Silicon Nitride, Phosphoro Silicate glass and Tungsten film materials.
- Used in the technology of cleaning the surface of electronic devices or printed circuits, manufacturing solar batteries, laser technology, insulating gas and refrigeration.
- As a detergent in manufacturing printed circuit technology.
- Possessing chemical stability, CF4 is also used in metal melting technology and plastic industry.
Specifications:
|
Contents
|
Unit
|
CARBON TETRAFLUORIDE
|
|
Purity
|
%
|
≥99,999
|
|
Nitrogen (N2)
|
ppm
|
≤1,0
|
|
Oxygen (O2)
|
ppm
|
≤0,5
|
|
Carbon monoxide (CO)
|
ppm
|
≤0,5
|
|
Carbon Dioxide (CO2)
|
ppm
|
≤0,5
|
|
Halocarbons (THC)
|
ppm
|
≤0,5
|
|
Sulfur Hexafluoride (SF6)
|
ppm
|
≤0,5
|
|
Moisture (H2O)
|
ppm
|
≤2,0
|
|
Acidity as HF
|
ppm
|
≤0,1
|
|
Volume of bottles /Weight/ Pressure
|
10L/4KG/100BAR và 40L/25KG/100BAR
|
|
Standard bottle container, valve connection
|
GB5099 – ISO 9809-3. Kết nối CGA320 / 716
|
|
Determination-color
|
Gray bottle cover
|
|
Feature
|
Colorless, odorless, non-toxic gas and highly volatile
|
|
Above specifications are only for reference, it may vary by actual shipment
|
For further information, please contact to Phu Tai Industry Co.,LTD!